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Samsung and mentor graphics expand calibre signoff and foundry maskprocessing solution for 20nm by icdenta icdenta





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Samsung and mentor graphics expand calibre signoff and foundry maskprocessing solution for 20nm by
Article Posted: 09/29/2013
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Samsung and mentor graphics expand calibre signoff and foundry maskprocessing solution for 20nm


 
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Posted: Jun 6th, 2012 Samsung and Mentor Graphics Expand Calibre Signoff and Foundry MaskProcessing Solution for 20nm ( Nanowerk News ) Mentor Graphics Corporation today announced that Mentor andSamsung Electronics have expanded their 20nm collaborationannounced in March to include Calibre® signoff design kits for20nm, including multiple approaches to double patterning (DP) andadvanced fill capabilities. Samsung has also signed an agreementlast November to expand its use of the Calibre platform forcomputational lithography, including advanced optical proximitycorrection and verification, and mask process correction. All theseefforts are to support increased production capacity for Samsung'srapidly growing foundry business. "The Mentor Calibre platform is Samsung Foundry's signoff andmanufacturing choice for a number of reasons" The collaborativedesign kit solution supports all International SemiconductorDevelopment Alliance (ISDA) DP design flows with design rule,layout versus schematic (LVS) checking, and parasitic extractionenhanced to meet the challenging requirements of 20nm designs.

Italso includes advanced capabilities for design-manufacturingco-optimization including intelligent multi-layer fill techniques,fast litho hotspot detection, and process friendly design support. "The Mentor Calibre platform is Samsung Foundry's signoff andmanufacturing choice for a number of reasons," said Dr. Kee SupKim, vice president of System LSI Design Technology team, DeviceSolutions, Samsung Electronics. "Calibre continues to provide themost advanced physical verification, design for manufacturing(DFM), and mask processing technology in support of Samsung'sadvanced process nodes.

The tight linkage between Calibre toolsprovides a co-optimized flow between design and manufacturing toaccelerate time to market. For example, using Calibre for both themanufacturing and design verification of double patterning allowsSamsung to provide our customers with greater options to addresstheir specific design style. Great performance, trusted results andopenness are all important for a solution that works regardless ofthe customer's design cockpit, the size of their designs, or theirpreferred approach to double patterning." Mentor partnered with Samsung to develop production-ready foundrykits for 28nm, which enable physical verification, litho checking,critical area analysis, critical feature analysis, and dummy fillsolutions. For the 20nm process, test chips coming from internalSamsung design teams and third-party IP providers have been tapedout using a comprehensive Mentor® flow includingmulti-patterning and advanced design-for-manufacturing (DFM)checks. The Calibre platform supports all DP styles includingcolorless, auto two color, mixed two color and manual two color.The platform also provides advanced features such as automateddecomposition and patented real-time graphical "error rings" forcoloring conflict resolution, which reduces time consumingiterations when fixing DP violations.

"The increasing challenges of 20nm make it imperative to have aclose working relationship among all elements of the foundryecosystem," said Joseph Sawicki, vice president and general managerof the Design-to-Silicon division of Mentor Graphics. "Our strongpartnership with Samsung continues to 20nm and beyond as we work todeliver the technology, performance, and capacity for all parts ofthe design and tape out flow so that mutual customers can readilyaccess Samsung's foundry offerings." To learn more about what Samsung and Mentor are providing to mutualcustomers, please visit either company's booth at this year'sDesign Automation Conference, June 4-6 in San Francisco, CA. Foradditional details, please go to Mentor's DAC web page at/go/dac-2012. About Mentor Graphics Mentor Graphics Corporation is a world leader in electronichardware and software design solutions, providing products,consulting services and award-winning support for the world's mostsuccessful electronic, semiconductor and systems companies.Established in 1981, the company reported revenues in the lastfiscal year of about $1,015 million. Corporate headquarters arelocated at 8005 S.W.

Boeckman Road, Wilsonville, Oregon 97070-7777.World Wide Web site: .

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